% IMPORTANT: The following is UTF-8 encoded. This means that in the presence % of non-ASCII characters, it will not work with BibTeX 0.99 or older. % Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or % “biber”. @PHDTHESIS{Wirth:1009726, author = {Wirth, Konstantin Georg}, othercontributors = {Taubner, Thomas and Dittmann, Regina}, title = {{N}ear-field optical characterization of few-layer graphene and memristive {T}a$_2${O}$_5$thin film devices}, school = {RWTH Aachen University}, type = {Dissertation}, address = {Aachen}, publisher = {RWTH Aachen University}, reportid = {RWTH-2025-03644}, pages = {1 Online-Ressource : Illustrationen}, year = {2025}, note = {Veröffentlicht auf dem Publikationsserver der RWTH Aachen University; Dissertation, RWTH Aachen University, 2025}, abstract = {Classical light microscopy is fundamentally limited by the diffraction limit, which restricts the minimal resolvable distance between two objects to roughly half of the wavelength of light. For visible light (around 500~nm wavelength), this limits resolution to approximately 250~nm. These limitations are even more pronounced in the infrared regime, with wavelengths typically exceeding $1~\textmu$ m. Scattering-type scanning near-field optical microscopy (s-SNOM) overcomes this limit, achieving wavelength-independent resolution down to 20~nm through optical near-field interactions between a sharp tip and a sample. This technique provides access to optical contrast mechanisms at the nanoscale, making it ideal for investigating structures larger than atomic scales but far below the diffraction limit.In this thesis, sub-diffraction limit structures are investigated with s-SNOM, focusing on two key areas in the basic research for novel materials for advanced electronic devices.The first part is focused on the characterization of few-layer graphene (FLG) in collaboration with partners from the Aachen Graphene $\\&$ 2D Materials Center. The second part of optical investigations of resistive switching devices was part of the Sonderforschungsbereich 917 "Nanoswitches", whose goal was to understand resistive switching phenomena in oxides and chalcogenides. The number of graphene layers and their orientation to each other greatly influences the electronic and optical properties of FLG. Characterizing the stacking order with infrared light between 0.2 and 0.9~eV gives access to characteristic absorption peaks around interband transitions, which are directly linked to the electronic structure. So far, the lack of tunable laser sources in the spectral range of the interband transitions inhibited the characterization of the stacking order on the nanoscale with s-SNOM. Here, a new tunable light source for s-SNOM is utilized to investigate the electronic properties and stacking order of FLG. A proof-of-principle experiment for s-SNOM spectroscopy at the interband transitions is performed in the spectral range between 0.28 and 0.54~eV to study the interband transitions in bilayer graphene (BLG).By tuning the laser system in the regime of interband transitions of BLG, we successfully extract the amplitude and phase of scattered light, enabling the reconstruction of the complex optical conductivity resonance around 0.39~eV.Subsequently, s-SNOM spectroscopy at the interband transitions is extended to characterize the stacking order in FLG by applying it to tetralayer graphene (4LG).By analyzing the characteristic interband transition contributions in the optical conductivity, we distinguish between stacking sequences, including rhombohedral (ABCA) and Bernal (ABAB) configurations. The approach enables us to identify and characterize domains of ABCB stacked 4LG, a configuration previously considered unstable, for the first time. The observation of ABCB stacking is verified by Raman and infrared spectroscopy. S-SNOM spectroscopy at the interband transitions paves the way for nanoscopic non-contact measurements of the electronic properties in complex hybrid 2D- and van-der-Waals material systems. Our results establish s-SNOM spectroscopy at the interband transitions as a semi-quantitative tool to assign stacking orders in FLG, even of previously unobserved ones. In the second part, s-SNOM is used to investigate oxide-based resistive switching devices. These devices rely on the formation of nanoscale conductive paths, known as filaments, which are crucial for device performance characteristics such as cycle-to-cycle variability, $R\textsubscript{off}/R\textsubscript{on}$ ratio, and endurance. Traditional techniques like conductive AFM or TEM require delaminating the metal top electrode, aggravating in-operando investigations. In contrast, s-SNOM allows for the non-invasive characterization of individual filaments in $Ta\textsubscript{2}O\textsubscript{5}$ thin films by integrating a transparent graphene top electrode.By selecting appropriate illumination frequencies, we can simultaneously trace filaments' evolution and device morphology changes over several switching cycles. Investigating filaments in oxides in the infrared regime promises a deeper understanding of resistive switching devices' microscopic behavior. S-SNOM applies to a wide range of resistive switching oxides, such as $HfO\textsubscript{2},$ $SrTiO\textsubscript{3},$ and $SiO\textsubscript{2}.$ Spectroscopy at the interband transitions in FLG and the in-situ characterization of memristive device with a transparent top electrode highlight the power of s-SNOM in the infrared regime to resolve and characterize structures well below the diffraction limit. The two parts demonstrate s-SNOM's capability for nanoscopic, non-contact measurements of electronic properties in complex layered material systems. The developed approaches pave the way for future research into graphene-based materials and resistive switching devices, potentially facilitating the easier characterization of these material systems on the nanoscale.}, cin = {131110 / 136720 / 130000}, ddc = {530}, cid = {$I:(DE-82)131110_20140620$ / $I:(DE-82)136720_20140620$ / $I:(DE-82)130000_20140620$}, pnm = {SFB 917 B05 - Untersuchung des Einflusses von Defekten auf die Ladungsträgereigenschaften beim resistiven Schalten mit Nahfeld-Mikroskopie und -Spektroskopie (B05) (202267494) / SFB 917: Resistiv schaltende Chalkogenide für zukünftige Elektronikanwendungen: Struktur, Kinetik und Bauelementskalierung "Nanoswitches" (167917811)}, pid = {G:(GEPRIS)202267494 / G:(GEPRIS)167917811}, typ = {PUB:(DE-HGF)11}, doi = {10.18154/RWTH-2025-03644}, url = {https://publications.rwth-aachen.de/record/1009726}, }