001032493 001__ 1032493 001032493 005__ 20260326050041.0 001032493 0247_ $$2ISBN$$a9781510694538 001032493 0247_ $$2ISBN$$a9781510694545 001032493 0247_ $$2ISSN$$a0277-786X 001032493 0247_ $$2ISSN$$a1996-756X 001032493 0247_ $$2SCOPUS$$aSCOPUS:2-s2.0-105024941870 001032493 0247_ $$2WOS$$aWOS:001697778800014 001032493 0247_ $$2doi$$a10.1117/12.3063352 001032493 037__ $$aRWTH-2026-03571 001032493 041__ $$aEnglish 001032493 1001_ $$aLangheinrich, Wolfram$$b0 001032493 1112_ $$a40. European Mask and Lithography Conference$$cDresden$$d2025-06-16 - 2025-06-18$$gEMLC 2025$$wGermany 001032493 245__ $$aFabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography$$honline, print 001032493 260__ $$bSPIE$$c2025 001032493 29510 $$a40th European Mask and Lithography Conference (EMLC 2025) : 16–18 June 2025, Dresden, Germany / Jo Finders, Ines Stolberg Editors ; Organized by VDE/VDI GMM – The Society of Microelectronics, Microsystems, and Precision Engineering (Germany) 001032493 300__ $$a6 Seiten 001032493 3367_ $$033$$2EndNote$$aConference Paper 001032493 3367_ $$0PUB:(DE-HGF)7$$2PUB:(DE-HGF)$$aContribution to a book 001032493 3367_ $$0PUB:(DE-HGF)8$$2PUB:(DE-HGF)$$aContribution to a conference proceedings$$bcontrib$$mcontrib 001032493 3367_ $$2BibTeX$$aINPROCEEDINGS 001032493 3367_ $$2DRIVER$$aconferenceObject 001032493 3367_ $$2DataCite$$aOutput Types/Conference Paper 001032493 3367_ $$2ORCID$$aCONFERENCE_PAPER 001032493 4900_ $$aProceedings of SPIE$$v13787 001032493 588__ $$aDataset connected to , , , CrossRef Conference 001032493 591__ $$aGermany 001032493 7001_ $$aBrackmann, Varvara$$b1 001032493 7001_ $$aFriedrich, Michael$$b2 001032493 7001_ $$aWislicenus, Marcus$$b3 001032493 7001_ $$aMuster, Pascal$$b4 001032493 7001_ $$aPregl, Sebastian$$b5 001032493 7001_ $$aReichmann, Felix$$b6 001032493 7001_ $$aKomerički, Nikola$$b7 001032493 7001_ $$aBougeard, Dominique$$b8 001032493 7001_ $$0P:(DE-82)801660$$aHuckemann, Till$$b9$$urwth 001032493 7001_ $$0P:(DE-82)IDM02206$$aSchreiber, Lars R.$$b10$$urwth 001032493 7001_ $$0P:(DE-82)IDM00099$$aBluhm, Jörg$$b11$$urwth 001032493 909CO $$ooai:publications.rwth-aachen.de:1032493$$pVDB 001032493 9101_ $$0I:(DE-588b)36225-6$$6P:(DE-82)801660$$aRWTH Aachen$$b9$$kRWTH 001032493 9101_ $$0I:(DE-588b)36225-6$$6P:(DE-82)IDM02206$$aRWTH Aachen$$b10$$kRWTH 001032493 9101_ $$0I:(DE-588b)36225-6$$6P:(DE-82)IDM00099$$aRWTH Aachen$$b11$$kRWTH 001032493 9141_ $$y2025 001032493 9151_ $$0StatID:(DE-HGF)0041$$2StatID$$aPeer review status of article unknown$$x0 001032493 9201_ $$0I:(DE-82)132210_20140620$$k132210$$lLehrstuhl für Experimentalphysik und II. Physikalisches Institut$$x0 001032493 9201_ $$0I:(DE-82)130000_20140620$$k130000$$lFachgruppe Physik$$x1 001032493 9201_ $$0I:(DE-82)080043_20160218$$k080043$$lJARA-Institut für Quanteninformation$$x2 001032493 961__ $$c2026-03-25T14:10:10.846849$$x2026-03-25T14:10:10.846849$$z2026-03-25T14:10:10.846849 001032493 980__ $$aI:(DE-82)080043_20160218 001032493 980__ $$aI:(DE-82)130000_20140620 001032493 980__ $$aI:(DE-82)132210_20140620 001032493 980__ $$aUNRESTRICTED 001032493 980__ $$aVDB 001032493 980__ $$acontb 001032493 980__ $$acontrib