Gast ::
| 001 | 1032493 | ||
| 005 | 20260326050041.0 | ||
| 024 | 7 | _ | |2 ISBN |a 9781510694538 |
| 024 | 7 | _ | |2 ISBN |a 9781510694545 |
| 024 | 7 | _ | |2 ISSN |a 0277-786X |
| 024 | 7 | _ | |2 ISSN |a 1996-756X |
| 024 | 7 | _ | |2 SCOPUS |a SCOPUS:2-s2.0-105024941870 |
| 024 | 7 | _ | |2 WOS |a WOS:001697778800014 |
| 024 | 7 | _ | |2 doi |a 10.1117/12.3063352 |
| 037 | _ | _ | |a RWTH-2026-03571 |
| 041 | _ | _ | |a English |
| 100 | 1 | _ | |a Langheinrich, Wolfram |b 0 |
| 111 | 2 | _ | |a 40. European Mask and Lithography Conference |c Dresden |d 2025-06-16 - 2025-06-18 |g EMLC 2025 |w Germany |
| 245 | _ | _ | |a Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography |h online, print |
| 260 | _ | _ | |b SPIE |c 2025 |
| 295 | 1 | 0 | |a 40th European Mask and Lithography Conference (EMLC 2025) : 16–18 June 2025, Dresden, Germany / Jo Finders, Ines Stolberg Editors ; Organized by VDE/VDI GMM – The Society of Microelectronics, Microsystems, and Precision Engineering (Germany) |
| 300 | _ | _ | |a 6 Seiten |
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| 490 | 0 | _ | |a Proceedings of SPIE |v 13787 |
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| 591 | _ | _ | |a Germany |
| 700 | 1 | _ | |a Brackmann, Varvara |b 1 |
| 700 | 1 | _ | |a Friedrich, Michael |b 2 |
| 700 | 1 | _ | |a Wislicenus, Marcus |b 3 |
| 700 | 1 | _ | |a Muster, Pascal |b 4 |
| 700 | 1 | _ | |a Pregl, Sebastian |b 5 |
| 700 | 1 | _ | |a Reichmann, Felix |b 6 |
| 700 | 1 | _ | |a Komerički, Nikola |b 7 |
| 700 | 1 | _ | |a Bougeard, Dominique |b 8 |
| 700 | 1 | _ | |0 P:(DE-82)801660 |a Huckemann, Till |b 9 |u rwth |
| 700 | 1 | _ | |0 P:(DE-82)IDM02206 |a Schreiber, Lars R. |b 10 |u rwth |
| 700 | 1 | _ | |0 P:(DE-82)IDM00099 |a Bluhm, Jörg |b 11 |u rwth |
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| 914 | 1 | _ | |y 2025 |
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