engLangheinrich, WolframBrackmann, VarvaraSchreiber, Lars R.Bluhm, JörgFriedrich, MichaelWislicenus, MarcusMuster, PascalPregl, SebastianReichmann, FelixKomerički, NikolaBougeard, DominiqueHuckemann, TillFabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithographySPIE, Proceedings of SPIE 13787, 6 Seiten (2025). doi:10.1117/12.3063352info:eu-repo/semantics/conferenceObjectinfo:eu-repo/semantics/publishedVersion40th European Mask and Lithography Conference (EMLC 2025) : 16–18 June 2025, Dresden, Germany / Jo Finders, Ines Stolberg Editors ; Organized by VDE/VDI GMM – The Society of Microelectronics, Microsystems, and Precision Engineering (Germany)40th European Mask and Lithography Conference (EMLC 2025) : 16–18 June 2025, Dresden, Germany / Jo Finders, Ines Stolberg Editors ; Organized by VDE/VDI GMM – The Society of Microelectronics, Microsystems, and Precision Engineering (Germany)<br/>40. European Mask and Lithography Conference, EMLC 2025, Dresden, Germany, 2025-06-16 - 2025-06-18SPIE2025info:eu-repo/semantics/closedAccessDEhttps://publications.rwth-aachen.de/record/1032493https://publications.rwth-aachen.de/search?p=id:%22RWTH-2026-03571%22Researchersinfo:eu-repo/semantics/altIdentifier/doi/10.1117/12.3063352info:eu-repo/semantics/altIdentifier/isbn/9781510694545info:eu-repo/semantics/altIdentifier/issn/1996-756Xinfo:eu-repo/semantics/altIdentifier/wos/WOS:001697778800014info:eu-repo/semantics/altIdentifier/issn/0277-786Xinfo:eu-repo/semantics/altIdentifier/isbn/9781510694538