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TY  - JOUR
AU  - Eden, K.
AU  - Krings, A.-M.
AU  - Beneking, H.
AU  - Maul, M.
AU  - Müller, J.
TI  - Degradation of Cr- and MoSi2 photomasks by 193 nm excimer laser radiation
JO  - Microelectronic engineering
VL  - 9
SN  - 0167-9317
CY  - Amsterdam [u.a.]
PB  - Elsevier
M1  - RWTH-CONV-051560
SP  - 65-68
PY  - 1989
LB  - PUB:(DE-HGF)16
UR  - https://publications.rwth-aachen.de/record/174316
ER  -