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%0 Journal Article
%A Maile, B. E.
%A Forchel, A.
%A German, R.
%A Menschig, A.
%A Meier, H. P.
%A Grützmacher, D.
%T Nanometer lithography for III-V semiconductor wires using chloromethylated poly-* methylstrene resist
%J Journal of vacuum science & technology : JVST / B
%V 6
%@ 0734-211x
%C New York, NY
%I American Institute of Physics
%M RWTH-CONV-051561
%P 2308-2311
%D 1989
%F PUB:(DE-HGF)16
%9 Journal Article
%U https://publications.rwth-aachen.de/record/174317