h1

h2

h3

h4

h5
h6
TY  - JOUR
AU  - Maile, B. E.
AU  - Forchel, A.
AU  - German, R.
AU  - Menschig, A.
AU  - Meier, H. P.
AU  - Grützmacher, D.
TI  - Nanometer lithography for III-V semiconductor wires using chloromethylated poly-* methylstrene resist
JO  - Journal of vacuum science & technology : JVST / B
VL  - 6
SN  - 0734-211x
CY  - New York, NY
PB  - American Institute of Physics
M1  - RWTH-CONV-051561
SP  - 2308-2311
PY  - 1989
LB  - PUB:(DE-HGF)16
UR  - https://publications.rwth-aachen.de/record/174317
ER  -