%0 Journal Article %A Leiber, J. %A Brauers, A. %A Heinecke, H. %A Lüth, H. %A Balk, P. %T Growth of GaAs and InP on Si using plasma stimulated MOCVD %J Journal of crystal growth %V 96 %@ 0022-0248 %C Amsterdam %I North-Holland Publ. Co. %M RWTH-CONV-051562 %P 483-489 %D 1989 %F PUB:(DE-HGF)16 %9 Journal Article %U https://publications.rwth-aachen.de/record/174318