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%0 Journal Article
%A Leiber, J.
%A Brauers, A.
%A Heinecke, H.
%A Lüth, H.
%A Balk, P.
%T Growth of GaAs and InP on Si using plasma stimulated MOCVD
%J Journal of crystal growth
%V 96
%@ 0022-0248
%C Amsterdam
%I North-Holland Publ. Co.
%M RWTH-CONV-051562
%P 483-489
%D 1989
%F PUB:(DE-HGF)16
%9 Journal Article
%U https://publications.rwth-aachen.de/record/174318