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TY  - JOUR
AU  - Leiber, J.
AU  - Brauers, A.
AU  - Heinecke, H.
AU  - Lüth, H.
AU  - Balk, P.
TI  - Growth of GaAs and InP on Si using plasma stimulated MOCVD
JO  - Journal of crystal growth
VL  - 96
SN  - 0022-0248
CY  - Amsterdam
PB  - North-Holland Publ. Co.
M1  - RWTH-CONV-051562
SP  - 483-489
PY  - 1989
LB  - PUB:(DE-HGF)16
UR  - https://publications.rwth-aachen.de/record/174318
ER  -