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%0 Journal Article
%A Hostalek, M.
%A Pohl, L.
%A Brauers, A.
%A Balk, P.
%A Frese, V.
%A Hardtdegen, Hilde
%A Hövel, R.
%A Regel, G. K.
%A Molassioti, A.
%A Moser, M.
%A Scholz, F.
%T Novel organometallic starting materials for group III-V semiconductor metal-organic chemical vapor deposition
%J Thin solid films
%V 174
%@ 0040-6090
%C Amsterdam [u.a.]
%I Elsevier
%M RWTH-CONV-051566
%P 1-4
%D 1989
%F PUB:(DE-HGF)16
%9 Journal Article
%U https://publications.rwth-aachen.de/record/174322