guest ::
| 001 | 174322 | ||
| 005 | 20170624082133.0 | ||
| 024 | 7 | _ | |2 ISSN |a 0040-6090 |
| 024 | 7 | _ | |2 HSB |a ama8285 |
| 037 | _ | _ | |a RWTH-CONV-051566 |
| 041 | _ | _ | |a English |
| 100 | 1 | _ | |0 P:(DE-82)110840 |a Hostalek, M. |b 0 |e Author |
| 245 | _ | _ | |a Novel organometallic starting materials for group III-V semiconductor metal-organic chemical vapor deposition |h online, print |
| 260 | _ | _ | |a Amsterdam [u.a.] |b Elsevier |c 1989 |
| 336 | 7 | _ | |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |a Journal Article |b journal |m journal |
| 336 | 7 | _ | |2 DataCite |a Output Types/Journal article |
| 336 | 7 | _ | |0 0 |2 EndNote |a Journal Article |
| 336 | 7 | _ | |2 BibTeX |a ARTICLE |
| 336 | 7 | _ | |2 ORCID |a JOURNAL_ARTICLE |
| 336 | 7 | _ | |2 DRIVER |a article |
| 700 | 1 | _ | |0 P:(DE-82)042311 |a Pohl, L. |b 1 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)024344 |a Brauers, A. |b 2 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)108534 |a Balk, P. |b 3 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)114220 |a Frese, V. |b 4 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)016304 |a Hardtdegen, Hilde |b 5 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)026361 |a Hövel, R. |b 6 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)114221 |a Regel, G. K. |b 7 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)114222 |a Molassioti, A. |b 8 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)046030 |a Moser, M. |b 9 |e Author |
| 700 | 1 | _ | |0 P:(DE-82)114223 |a Scholz, F. |b 10 |e Author |
| 773 | _ | _ | |0 PERI:(DE-600)1482896-0 |p 1-4 |t Thin solid films |v 174 |x 0040-6090 |
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| 915 | 1 | _ | |0 StatID:(DE-HGF)0031 |2 StatID |a Peer reviewed article |
| 920 | 1 | _ | |0 I:(DE-82)ama216_20140620 |k ama216 |l Lehr- und Forschungsgebiet Halbleitertechnologie |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)616210_20140620 |k 616210 |l Lehrstuhl und Institut für Halbleitertechnik |x 1 |
| 970 | _ | _ | |a ama8285 |
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| 980 | _ | _ | |a VDB |
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