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%0 Journal Article
%A Eden, K.
%A Beneking, H.
%A Roth, W.
%A Krings, A.-M.
%T Influence of DUV excimer laser radiation ( = 193nm) on CMOS devices
%J Applied surface science
%V 36
%@ 0169-4332
%C Amsterdam [u.a.]
%I Elsevier
%M RWTH-CONV-051567
%P 421-431
%D 1989
%F PUB:(DE-HGF)16
%9 Journal Article
%U https://publications.rwth-aachen.de/record/174323