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TY  - JOUR
AU  - Eden, K.
AU  - Beneking, H.
AU  - Roth, W.
AU  - Krings, A.-M.
TI  - Influence of DUV excimer laser radiation ( = 193nm) on CMOS devices
JO  - Applied surface science
VL  - 36
SN  - 0169-4332
CY  - Amsterdam [u.a.]
PB  - Elsevier
M1  - RWTH-CONV-051567
SP  - 421-431
PY  - 1989
LB  - PUB:(DE-HGF)16
UR  - https://publications.rwth-aachen.de/record/174323
ER  -