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@ARTICLE{Eden:174323,
      author       = {Eden, K. and Beneking, H. and Roth, W. and Krings, A.-M.},
      title        = {{I}nfluence of {DUV} excimer laser radiation ( = 193nm) on
                      {CMOS} devices},
      journal      = {Applied surface science},
      volume       = {36},
      issn         = {0169-4332},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier},
      reportid     = {RWTH-CONV-051567},
      pages        = {421-431},
      year         = {1989},
      cin          = {ama216 / 616210},
      cid          = {$I:(DE-82)ama216_20140620$ / $I:(DE-82)616210_20140620$},
      typ          = {PUB:(DE-HGF)16},
      url          = {https://publications.rwth-aachen.de/record/174323},
}