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000183676 001__ 183676
000183676 005__ 20201204105438.0
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000183676 0247_ $$2ISSN$$a0262-8171
000183676 0247_ $$2ISSN$$a1361-6463
000183676 0247_ $$2WOS$$aWOS:000260156200030
000183676 0247_ $$2DOI$$a10.1088/0022-3727/41/21/215301
000183676 0247_ $$2HSB$$a999910054306
000183676 0247_ $$2SCOPUS$$aSCOPUS:2-s2.0-58149342089
000183676 037__ $$aRWTH-CONV-060239
000183676 041__ $$aEnglish
000183676 1001_ $$0P:(DE-82)016251$$aSarakinos, K.$$b0$$eAuthor
000183676 245__ $$aA semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering$$honline, print
000183676 260__ $$aBristol$$bIOP Publ.$$c2008
000183676 300__ $$a9 S.
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000183676 591__ $$aGermany
000183676 7001_ $$0P:(DE-82)008005$$aAlami, Jones$$b1$$eAuthor
000183676 7001_ $$0P:(DE-82)016433$$aDukwen, Julia$$b2$$eAuthor
000183676 7001_ $$0P:(DE-82)104696$$aWördenweber, Jan$$b3$$eAuthor
000183676 7001_ $$0P:(DE-82)IDM00089$$aWuttig, Matthias$$b4$$eAuthor
000183676 773__ $$0PERI:(DE-600)1472948-9$$a10.1088/0022-3727/41/21/215301$$n21$$p215301$$tJournal of physics / D, Applied physics$$v41$$x0022-3727
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000183676 9201_ $$0I:(DE-82)131110_20140620$$k131110$$lLehrstuhl für Experimentalphysik I A und I. Physikalisches Institut$$x1
000183676 961__ $$c2014-12-01$$x2011-07-29$$z2012-02-20
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