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@ARTICLE{Kurapova:188130,
      author       = {Kurapova, O. and Lengeler, Bruno and Schroer, C. G. and
                      Kuechler, M. and Gessner, T. and van der Hart, A.},
      title        = {{O}ptimized fabrication of silicon nanofocusing x-ray
                      lenses using deep reactive ion etching},
      journal      = {Journal of vacuum science $\&$ technology : JVST / B},
      volume       = {25},
      number       = {5},
      issn         = {0734-211x},
      address      = {New York, NY},
      publisher    = {American Vacuum Society},
      reportid     = {RWTH-CONV-064475},
      pages        = {1626-1629},
      year         = {2007},
      cin          = {132310 / hsbk010098 / 130000},
      cid          = {$I:(DE-82)132310_20140620$ / $I:(DE-82)hsbk010098_20140620$
                      / $I:(DE-82)130000_20140620$},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000250433500015},
      doi          = {10.1116/1.2769361},
      url          = {https://publications.rwth-aachen.de/record/188130},
}