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001     188130
005     20201203140408.0
024 7 _ |2 ISSN
|a 1071-1023
024 7 _ |2 ISSN
|a 0734-211x
024 7 _ |2 WOS
|a WOS:000250433500015
024 7 _ |2 DOI
|a 10.1116/1.2769361
024 7 _ |2 HSB
|a 999910098874
024 7 _ |2 SCOPUS
|a SCOPUS:2-s2.0-34648824399
037 _ _ |a RWTH-CONV-064475
041 _ _ |a English
100 1 _ |0 P:(DE-82)026535
|a Kurapova, O.
|b 0
|e Author
245 _ _ |a Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching
|h online, print
260 _ _ |a New York, NY
|b American Vacuum Society
|c 2007
336 7 _ |0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
|a Journal Article
|b journal
|m journal
336 7 _ |2 DataCite
|a Output Types/Journal article
336 7 _ |0 0
|2 EndNote
|a Journal Article
336 7 _ |2 BibTeX
|a ARTICLE
336 7 _ |2 ORCID
|a JOURNAL_ARTICLE
336 7 _ |2 DRIVER
|a article
591 _ _ |a Germany
700 1 _ |0 P:(DE-82)041977
|a Lengeler, Bruno
|b 1
|e Author
700 1 _ |0 P:(DE-82)026531
|a Schroer, C. G.
|b 2
|e Author
700 1 _ |0 P:(DE-82)143755
|a Kuechler, M.
|b 3
|e Author
700 1 _ |0 P:(DE-82)143756
|a Gessner, T.
|b 4
|e Author
700 1 _ |0 P:(DE-82)142108
|a van der Hart, A.
|b 5
|e Author
773 _ _ |0 PERI:(DE-600)1475429-0
|a 10.1116/1.2769361
|n 5
|p 1626-1629
|t Journal of vacuum science & technology : JVST / B
|v 25
|x 0734-211x
909 C O |o oai:publications.rwth-aachen.de:188130
|p VDB
915 1 _ |0 StatID:(DE-HGF)0031
|2 StatID
|a Peer reviewed article
920 1 _ |0 I:(DE-82)132310_20140620
|k 132310
|l Lehrstuhl für Experimentalphysik (Festkörperphysik) und II. Physikalisches Institut
|x 0
920 1 _ |0 I:(DE-82)hsbk010098_20140620
|k hsbk010098
|l Physikalisches Institut II
|x 1
920 1 _ |0 I:(DE-82)130000_20140620
|k 130000
|l Fachgruppe Physik
|x 2
970 _ _ |a hsb999910098874
980 _ _ |a journal
980 _ _ |a I:(DE-82)132310_20140620
980 _ _ |a I:(DE-82)hsbk010098_20140620
980 _ _ |a I:(DE-82)130000_20140620
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a ConvertedRecord


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