%0 Journal Article %A Knoch, Joachim %A Müller, M. R. %T Electrostatic Doping : Controlling the Properties of Carbon-Based FETs With Gates %J IEEE nanotechnology magazine %V 13 %N 6 %@ 1536-125X %C New York, NY %I IEEE %M RWTH-CONV-090710 %P 1044-1052 %D 2014 %F PUB:(DE-HGF)16 %9 Journal Article %U <Go to ISI:>//WOS:000345087900005 %R 10.1109/TNANO.2014.2323436 %U https://publications.rwth-aachen.de/record/460548