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<oai_dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd http://dublincore.org/schemas/xmls/qdc/dcterms.xsd"><dc:language>eng</dc:language><dc:creator>Xu, Ming</dc:creator><dc:creator>Zhang, Wei</dc:creator><dc:creator>Mazzarello, Riccardo</dc:creator><dc:creator>Wuttig, Matthias</dc:creator><dc:title>Disorder Control in Crystalline GeSb2Te4 Using High Pressure</dc:title><dc:subject>info:eu-repo/classification/ddc/500</dc:subject><dc:source>Advanced science 2(8), 1500117 (2015). doi:10.1002/advs.201500117</dc:source><dc:type>info:eu-repo/semantics/article</dc:type><dc:type>info:eu-repo/semantics/publishedVersion</dc:type><dc:publisher>Wiley-VCH</dc:publisher><dc:date>2015</dc:date><dc:rights>info:eu-repo/semantics/openAccess</dc:rights><dc:coverage>DE</dc:coverage><dc:identifier>https://publications.rwth-aachen.de/record/483858</dc:identifier><dc:identifier>https://publications.rwth-aachen.de/search?p=id:%22RWTH-2015-04828%22</dc:identifier><dc:audience>Researchers</dc:audience><dc:relation>info:eu-repo/semantics/altIdentifier/wos/WOS:000368997300010</dc:relation><dc:relation>info:eu-repo/semantics/altIdentifier/doi/10.1002/advs.201500117</dc:relation><dc:relation>info:eu-repo/semantics/altIdentifier/pmid/pmid:27708999</dc:relation><dc:relation>info:eu-repo/semantics/altIdentifier/doi/10.18154/RWTH-2015-04828</dc:relation><dc:relation>info:eu-repo/semantics/altIdentifier/issn/2198-3844</dc:relation></oai_dc:dc>

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