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@PHDTHESIS{Foltyski:672605,
author = {Foltyński, Bartosz},
othercontributors = {Heuken, Michael and Mokwa, Wilfried},
title = {{MOVPE} growth and characterization of {G}a{N}/{I}n{G}a{N}
nanowires and microrods for next generation
solid-state-lighting applications},
school = {Rheinisch-Westfälische Technische Hochschule Aachen},
type = {Dissertation},
address = {Aachen},
reportid = {RWTH-2016-08172},
pages = {1 Online-Ressource (II,112 Seiten) : Illustrationen,
Diagramme},
year = {2016},
note = {Veröffentlicht auf dem Publikationsserver der RWTH Aachen
University; Dissertation, Rheinisch-Westfälische Technische
Hochschule Aachen, 2016},
abstract = {A comprehensive study has been conducted in order to
develop, understand and define the epitaxial growth process
of InGaN/GaN nanowires (NW) and qualify their properties for
application in future nanoLED devices. Vapor-liquid-solid
(VLS) growth mode, selective area growth (SAG) and
self-organized growth were investigated as three different
approaches to create GaN rod structures. All of the grown
samples were characterized by means of different
complementary non-destructive techniques to analyze
electrical and optical properties. In particular the QW
emission was studied by microphotoluminescence (µPL), the
crystal quality and strain through Raman scattering and the
crystal structure by transmission electron microscopy (TEM).
Some of the developed NWs were analyzed using advanced
measurement set-up, in particular: nano-scale
cathodoluminescence (CL) mapping or synchrotron-based
characterization, including hard X-ray nanoprobe and X-ray
fluorescence (XRF). The complex characterization allowed to
understand the optical and structural properties of grown
nanostructures and therefore helped to improve the growth
process. Based on the obtained results, the development of
selective area growth of GaN microrods on Si(111) substrates
by MOCVD is discussed together with characterization and
understanding of structural and optical properties of
individual GaN rods. Additionally, the novel, innovative
self-organized growth of GaN NWs on Si(111) is proposed as
an alternative to the time consuming and expensive SAG
method. The nano-scale characterization and understanding of
structural and optical properties of newly developed
InGaN/GaN NWs on silicon substrate are discussed providing
the description of the current status of GaN NW on Si growth
and the role of GaN rod on Si as the building block for the
nanoLED.},
cin = {612020},
ddc = {621.3},
cid = {$I:(DE-82)612020_20140620$},
typ = {PUB:(DE-HGF)11},
urn = {urn:nbn:de:hbz:82-rwth-2016-081720},
url = {https://publications.rwth-aachen.de/record/672605},
}