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%0 Thesis
%A Kim, Hyun-su
%T Interference lithography with extreme ultraviolet light
%I RWTH Aachen University und University of Southampton
%V Dissertation
%C Aachen
%M RWTH-2017-02814
%P 1 Online-Ressource (149 Seiten) : Illustrationen, Diagramme
%D 2016
%Z Cotutelle-Dissertation. - Veröffentlicht auf dem Publikationsserver der RWTH Aachen University 2017
%Z Dissertation, RWTH Aachen University und University of Southampton, 2016
%X In photolithography, increasing pattern density is a key issue for development ofsemiconductor devices. Extreme ultraviolet (EUV) radiation is the next generationlight source for overcoming the resolution limit of conventional photolithographyin order to obtain nanostructures of higher density. In this thesis, we focus oninvestigating resolution limits of interference patterns produced by EUV radiation.Optical properties of interference fringes obtained using different types ofcompact EUV sources are studied with regard to increasing pattern density.Rigorous simulations of optical wave propagation of EUV radiation are performedto investigate the resolution limits of interference fringes for the fractional Talboteffect, the achromatic Talbot effect, and an image of Talbot carpet that has anoptical property of ever-decreasing size of interference fringes. In experiments,interference lithography has been performed with three different types of compactEUV sources including a gas discharge produced plasma, a plasma based EUVlaser, and a high-harmonic generation source. We analyze optical characteristics ofparticular EUV sources resulting in different capabilities of patterning. Alsodifferent optical system designs capable of overcoming the limitations of opticalproperties of EUV radiation are investigated. We expect that the study of EUVinterference lithography can be helpful for understanding the upcomingphotolithography resolution and also can be useful as a technology for fabricatingvery fine structures.
%F PUB:(DE-HGF)11
%9 Dissertation / PhD Thesis
%R 10.18154/RWTH-2017-02814
%U https://publications.rwth-aachen.de/record/686391