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%0 Conference Paper
%A Brose, Sascha
%A Danylyuk, Serhiy
%A Bahrenberg, Lukas
%A Lebert, Rainer
%A Stollenwerk, Jochen
%A Loosen, Peter
%A Juschkin, Larissa
%T EUV-LET 2.0 : a compact exposure tool for industrial research at a wavelength of 13.5nm
%V 10957
%C Bellingham, Washington, USA
%I SPIE
%M RWTH-2019-05372
%B Proceedings of SPIE
%P 109571K
%D 2019
%< Extreme Ultraviolet (EUV) Lithography X : 25-28 February 2019, San Jose, California, Unites States / Kenneth A. Goldberg (editor) ; sponsored by: SPIE
%B Extreme Ultraviolet (EUV) Lithography X
%C 25 Feb 2019 - 28 Feb 2019, San Jose, CA (USA)
Y2 25 Feb 2019 - 28 Feb 2019
M2 San Jose, CA, USA
%F PUB:(DE-HGF)7 ; PUB:(DE-HGF)8
%9 Contribution to a bookContribution to a conference proceedings
%U <Go to ISI:>//WOS:000468221400032
%R 10.1117/12.2513755
%U https://publications.rwth-aachen.de/record/762075