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TY  - CONF
AU  - Brose, Sascha
AU  - Danylyuk, Serhiy
AU  - Bahrenberg, Lukas
AU  - Lebert, Rainer
AU  - Stollenwerk, Jochen
AU  - Loosen, Peter
AU  - Juschkin, Larissa
TI  - EUV-LET 2.0 : a compact exposure tool for industrial research at a wavelength of 13.5nm
VL  - 10957
CY  - Bellingham, Washington, USA
PB  - SPIE
M1  - RWTH-2019-05372
T2  - Proceedings of SPIE
SP  - 109571K
PY  - 2019
T2  - Extreme Ultraviolet (EUV) Lithography X
CY  - 25 Feb 2019 - 28 Feb 2019, San Jose, CA (USA)
Y2  - 25 Feb 2019 - 28 Feb 2019
M2  - San Jose, CA, USA
LB  - PUB:(DE-HGF)7 ; PUB:(DE-HGF)8
UR  - <Go to ISI:>//WOS:000468221400032
DO  - DOI:10.1117/12.2513755
UR  - https://publications.rwth-aachen.de/record/762075
ER  -