h1

h2

h3

h4

h5
h6
% IMPORTANT: The following is UTF-8 encoded.  This means that in the presence
% of non-ASCII characters, it will not work with BibTeX 0.99 or older.
% Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or
% “biber”.

@PHDTHESIS{Wirtssohn:775258,
      author       = {Wirtssohn, Matti},
      othercontributors = {Wuttig, Matthias and Waser, Rainer},
      title        = {{S}tudy on growth of epitaxial single domain tin-telluride
                      and epitaxial antimony on silicon and sputter-grown
                      bismuth-tin-telluride nanowhiskers},
      school       = {RWTH Aachen University},
      type         = {Dissertation},
      address      = {Aachen},
      reportid     = {RWTH-2019-12085},
      pages        = {1 Online-Ressource (ix, 171, XLIII Seiten) :
                      Illustrationen, Diagramme},
      year         = {2019},
      note         = {Veröffentlicht auf dem Publikationsserver der RWTH Aachen
                      University 2020; Dissertation, RWTH Aachen University, 2019},
      abstract     = {This work mainly deals with the deposition and
                      characterization of thin films on silicon surfaces. Within
                      this work, three different material systems are studied.
                      Consequently it is divided into the following three
                      sections:1. Epitaxial growth of SnTe(001) on Si(111)2.
                      Epitaxial growth of Sb(0001) on Si(111)3. Sputter-grown
                      bismuth-tin-telluride nanowhiskers. The first two segments
                      focus on investigation and discussion of the growth process
                      and resulting structure of the given materials. The third
                      chapter however, is centered more on the handling and
                      preparation of sputtered crystalline nanostructures to test
                      their feasibility for further device fabrication. The growth
                      process of epitaxial SnTe(001) on
                      Si(111)−$\sqrt3$×$\sqrt3$−R30°−Sb terminated
                      surfaces is studied. From the combination of the threefold
                      symmetry of the Si(111) surface and the fourfold symmetry of
                      the cubic SnTe(001) layer, a twelve-fold symmetry of three
                      energetically equivalent rotational domains should
                      expectably emerge. The presented films however, are
                      single-domain SnTe(001) films. It will be shown, that by
                      alignment of the wafer miscut and the Sb surface
                      termination, the rotational symmetry of the film-substrate
                      interface can be eliminated. As a result the SnTe(001)
                      layers are governed by only one rotational domain. These
                      findings are compared to SnTe(001) films grown on Si(111)
                      − 7 × 7 reconstructed surfaces, consisting of six
                      rotational domains. This illustrates the vast improvements
                      made possible by the presented growth process. This
                      mechanism of breaking the symmetry condition at the
                      film-substrate interface might likewise apply similarly to
                      other systems. Furthermore the gathered information on SnTe
                      growth behavior is exploited to fabricate single-domain
                      SnTe(001) devices for electrical testing. Electrical testing
                      is carried out at temperatures between 2 K and 300 K. The
                      devices consist of SnTe layers with a Sn contents of 50.0
                      at.\% to 51.5 at.\%. The growth of epitaxial Sb on the
                      Si(111) − 7 × 7 surface reconstruction is presented.
                      Highly out-of-plane textured Sb(0001) layers were produced
                      by molecular beam epitaxy. Substrate temperature, deposition
                      rate and film thickness are varied and compared. In all
                      scenarios the film consists of predominantly smooth and flat
                      Sb(0001) and some Sb(01$\bar1$2) grains. The observations
                      suggests that at first the step edges and Si(111) − 7 × 7
                      domain boundaries on the surface are decorated with
                      approximately 2 nm Sb. Then the film starts growing from
                      these decorated steps as crystalline Sb(0001) islands. The
                      Sb(01$\bar1$2) grains are found to emerge on these
                      steps/domain boundaries as well. The Sb(0001) films exhibit
                      rotational domains of ±6.1°, ±16.0° and ±30.1°
                      regarding the silicon substrate. The results are compared to
                      GeTe and Sb$_{2}$Te$_{3}$ films grown under comparable
                      conditions. Sputter-grown Sn$_{x}$Bi$_{y}$Te$_{z}$
                      nanowhiskers are presented. Structural analysis determines
                      highly ordered nanowhiskers free of structural defects.
                      Analysis of the composition yields a
                      Sn$_{1}$Bi$_{2}$Te$_{4}$ stoichiometry. The presented
                      handling of the nanostructures shows that further processing
                      can be done to fabricate functional devices. Conducted
                      4-terminal-sensing is performed as a proof of concept,
                      showing that other methods of characterization are possible
                      on the devices.},
      cin          = {131110 / 130000},
      ddc          = {530},
      cid          = {$I:(DE-82)131110_20140620$ / $I:(DE-82)130000_20140620$},
      typ          = {PUB:(DE-HGF)11},
      doi          = {10.18154/RWTH-2019-12085},
      url          = {https://publications.rwth-aachen.de/record/775258},
}