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%0 Journal Article
%A Deuter, Valerie
%A Grochowicz, Maciej
%A Brose, Sascha
%A Biller, Jan
%A Danylyuk, Serhiy
%A Taubner, Thomas
%A Siemion, Agnieszka
%A Grützmacher, Detlev
%A Juschkin, Larissa
%T Computational proximity lithography with extreme ultraviolet radiation
%J Optics express
%V 28
%N 18
%@ 1094-4087
%C Washington, DC
%I Optical Society of America
%M RWTH-2020-09340
%P 27000-27012
%D 2020
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000565713200110
%$ pmid:32906962
%R 10.1364/OE.398805
%U https://publications.rwth-aachen.de/record/802247