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<oai_dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd http://dublincore.org/schemas/xmls/qdc/dcterms.xsd"><dc:language>ger</dc:language><dc:creator>Bahrenberg, Lukas Fabian</dc:creator><dc:contributor>Loosen, Peter</dc:contributor><dc:contributor>Lemme, Max C.</dc:contributor><dc:title>Charakterisierung nanoskaliger Gitter mittels Spektrometrie im Extrem-Ultraviolett</dc:title><dc:subject>info:eu-repo/classification/ddc/620</dc:subject><dc:subject>EUV</dc:subject><dc:subject>Halbleitermesstechnik</dc:subject><dc:subject>Spektrometrie</dc:subject><dc:subject>critical dimension</dc:subject><dc:subject>kritische Abmessung</dc:subject><dc:subject>semiconductor metrology</dc:subject><dc:subject>spectrometry</dc:subject><dc:description>This work shows for the first time the dimensional characterization of nanoscale gratings with dimensions smaller than 100 nm by model-based spectrometry in the extreme ultraviolet spectral range (5 nm to 20 nm wavelength). The investigated grating parameters include the line height, the line width, the sidewall angle and corner radii. A comparison to longer wavelengths, especially in the visible regime, as they are used in state-of-the-art techniques, shows that the reflectance in the extreme ultraviolet in some cases is more than an order of magnitude more sensitive to variations in the geometry of nanoscale gratings. Spectrometry in the extreme ultraviolet currently exhibits measurable contrasts for dimensional variations in the sub-percent regime, equaling less than 1 nm and 1° in absolute values. In an experimental validation of the method, spectrometry in the extreme ultraviolet for the characterization of nanoscale gratings is implemented in a stand-alone setup, which demonstrates the potential employment of the method for industrial applications in semiconductor metrology. Using the stand-alone setup, the geometrical dimensions of nanoscale grating are characterized through fits to the measured reflectance obtained through rigorous electromagnetic modeling. The results are compared to an independent characterization by means of scanning electron microscopy.</dc:description><dc:source>Aachen : RWTH Aachen University 1 Online-Ressource : Illustrationen, Diagramme (2021). doi:10.18154/RWTH-2021-03680 = Dissertation, Rheinisch-Westfälische Technische Hochschule Aachen, 2021</dc:source><dc:type>info:eu-repo/semantics/doctoralThesis</dc:type><dc:type>info:eu-repo/semantics/publishedVersion</dc:type><dc:publisher>RWTH Aachen University</dc:publisher><dc:date>2021</dc:date><dc:rights>info:eu-repo/semantics/openAccess</dc:rights><dc:coverage>DE</dc:coverage><dc:identifier>https://publications.rwth-aachen.de/record/817091</dc:identifier><dc:identifier>https://publications.rwth-aachen.de/search?p=id:%22RWTH-2021-03680%22</dc:identifier><dc:audience>Students</dc:audience><dc:audience>Student Financial Aid Providers</dc:audience><dc:audience>Teachers</dc:audience><dc:audience>Researchers</dc:audience><dc:relation>info:eu-repo/semantics/altIdentifier/doi/10.18154/RWTH-2021-03680</dc:relation></oai_dc:dc>

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