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000969149 245__ $$aComparative Study of Surface Activation Steps for Thermally Grown Oxide Interface and Optimal Silanization$$honline
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000969149 7001_ $$0P:(DE-588)1294800507$$aTintelott, Marcel J.$$b1$$urwth
000969149 7001_ $$0P:(DE-82)969169$$aAmiri, Hesam$$b2$$urwth
000969149 7001_ $$0P:(DE-82)969170$$aKasavetov, Martin$$b3$$urwth
000969149 7001_ $$0P:(DE-82)IDM05981$$aBesedin, Denis$$b4$$urwth
000969149 7001_ $$0P:(DE-82)IDM03284$$aIngebrandt, Sven$$b5$$urwth
000969149 7001_ $$0P:(DE-82)IDM01301$$aVu, Xuan Thang$$b6$$urwth
000969149 7001_ $$0P:(DE-82)IDM06740$$aPachauri, Vivek$$b7$$eCorresponding author$$urwth
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