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@ARTICLE{Stern:988878,
      author       = {Stern, Christian and Schwab, Christian and Kindelmann,
                      Moritz and Stamminger, Mark and Weirich, Thomas E. and Park,
                      Inhee and Hausen, Florian and Finsterbusch, Martin and Bram,
                      Martin and Guillon, Olivier},
      title        = {{C}orrelative characterization of plasma etching resistance
                      of various aluminum garnets},
      journal      = {Journal of the American Ceramic Society},
      volume       = {107},
      number       = {11},
      issn         = {1551-2916},
      address      = {Oxford [u.a.]},
      publisher    = {Wiley-Blackwell},
      reportid     = {RWTH-2024-06463},
      pages        = {7105-7118},
      year         = {2024},
      cin          = {025000 / 524510 / 520000 / 155620 / 150000 / 080011},
      ddc          = {660},
      cid          = {$I:(DE-82)025000_20140620$ / $I:(DE-82)524510_20140620$ /
                      $I:(DE-82)520000_20140620$ / $I:(DE-82)155620_20231026$ /
                      $I:(DE-82)150000_20140620$ / $I:(DE-82)080011_20140620$},
      typ          = {PUB:(DE-HGF)16 / PUB:(DE-HGF)7},
      UT           = {WOS:001247850500001},
      doi          = {10.1111/jace.19951},
      url          = {https://publications.rwth-aachen.de/record/988878},
}