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Volatile and Nonvolatile Resistive Switching in Wafer-Scale MoS2 Memristors
Fa, Y. ; Braun, D. ; Völkel, L. ; Lerch, H. ; ; et al
2025 Silicon Nanoelectronics Workshop : June 8-9, 2025, Rihga Royal Hotel Kyoto, Kyoto, Japan : workshop abstracts / AP, [the Japan Society of Applied Physics], Electron Devices Society ; general chair: Kuniyuki Kakushima (Institute of Science Tokyo), Seiten/Artikel-Nr: 80-81
DOI: 10.23919/SNW65111.2025.11097209
Abstract/Contribution to a book/Contribution to a conference proceedings
2025
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