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Residual stress measurement of physical vapor deposition (PVD) AlTiN thin films - a comparative study of x-Ray diffraction-, Raman spectroscopic and ring core method
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In
The international journal of advanced manufacturing technology 144(9/10), Seiten/Artikel-Nr.:7317-7332
2026
Online
DOI: 10.18154/RWTH-2026-05399
DOI: 10.1007/s00170-026-18314-z
URL: https://publications.rwth-aachen.de/record/1036299/files/1036299.pdf
Einrichtungen
Thematische Einordnung (Klassifikation)
DDC: 670
OpenAccess: 
PDF
Dokumenttyp
Journal Article
Format
online, print
Sprache
English
Anmerkung
Peer reviewed article
Externe Identnummern
SCOPUS: SCOPUS:2-s2.0-105039296296
WOS Core Collection: WOS:001765216200001
Interne Identnummern
RWTH-2026-05399
Datensatz-ID: 1036299
Beteiligte Länder
Germany
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