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@ARTICLE{Deuter:802247,
author = {Deuter, Valerie and Grochowicz, Maciej and Brose, Sascha
and Biller, Jan and Danylyuk, Serhiy and Taubner, Thomas and
Siemion, Agnieszka and Grützmacher, Detlev and Juschkin,
Larissa},
title = {{C}omputational proximity lithography with extreme
ultraviolet radiation},
journal = {Optics express},
volume = {28},
number = {18},
issn = {1094-4087},
address = {Washington, DC},
publisher = {Optical Society of America},
reportid = {RWTH-2020-09340},
pages = {27000-27012},
year = {2020},
cin = {053100 / 080009 / 139420 / 130000 / 418910 / 136720},
ddc = {530},
cid = {$I:(DE-82)053100_20140620$ / $I:(DE-82)080009_20140620$ /
$I:(DE-82)139420_20140620$ / $I:(DE-82)130000_20140620$ /
$I:(DE-82)418910_20140620$ / $I:(DE-82)136720_20140620$},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000565713200110},
pubmed = {pmid:32906962},
doi = {10.1364/OE.398805},
url = {https://publications.rwth-aachen.de/record/802247},
}
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