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@ARTICLE{Deuter:802247,
      author       = {Deuter, Valerie and Grochowicz, Maciej and Brose, Sascha
                      and Biller, Jan and Danylyuk, Serhiy and Taubner, Thomas and
                      Siemion, Agnieszka and Grützmacher, Detlev and Juschkin,
                      Larissa},
      title        = {{C}omputational proximity lithography with extreme
                      ultraviolet radiation},
      journal      = {Optics express},
      volume       = {28},
      number       = {18},
      issn         = {1094-4087},
      address      = {Washington, DC},
      publisher    = {Optical Society of America},
      reportid     = {RWTH-2020-09340},
      pages        = {27000-27012},
      year         = {2020},
      cin          = {053100 / 080009 / 139420 / 130000 / 418910 / 136720},
      ddc          = {530},
      cid          = {$I:(DE-82)053100_20140620$ / $I:(DE-82)080009_20140620$ /
                      $I:(DE-82)139420_20140620$ / $I:(DE-82)130000_20140620$ /
                      $I:(DE-82)418910_20140620$ / $I:(DE-82)136720_20140620$},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000565713200110},
      pubmed       = {pmid:32906962},
      doi          = {10.1364/OE.398805},
      url          = {https://publications.rwth-aachen.de/record/802247},
}