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Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN
; ; ; ;
In
Thin solid films 732, Seiten/Artikel-Nr.:138792
2021
Online
DOI: 10.1016/j.tsf.2021.138792
URL: https://publications.rwth-aachen.de/record/823012/files/823012.pdf
Einrichtungen
Thematische Einordnung (Klassifikation)
DDC: 660
Restricted: 
PDF
Dokumenttyp
Journal Article
Format
online, print
Sprache
English
Anmerkung
Peer reviewed article
Externe Identnummern
SCOPUS: SCOPUS:2-s2.0-85109493159
WOS Core Collection: WOS:000672538500007
Interne Identnummern
RWTH-2021-07145
Datensatz-ID: 823012
Beteiligte Länder
Germany
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