Impurity sources and incorporation pathways during sputter deposition of Mg and Al thin films

Aliramaji, Shamsa; Mráz, Stanislav; Depla, Diederik; Primetzhofer, Daniel; Hans, Marcus; Keuter, Philipp; Schneider, Jochen M.; Neuß, Deborah

doi:1879-3347

Impurity sources and incorporation pathways during sputter deposition of Mg and Al thin films

Aliramaji, Shamsa^RWTH* ; Keuter, Philipp^RWTH* ; Mráz, Stanislav^RWTH* ; Neuß, Deborah^RWTH* ; Hans, Marcus^RWTH* ; Primetzhofer, Daniel ; Depla, Diederik ; Schneider, Jochen M. (Corresponding author)^RWTH*

In
Surface and coatings technology 510, Seiten/Artikel-Nr.:132216

2025

ImpressumAmsterdam [u.a.] : Elsevier Science

Umfang[1]-8

ISSN1879-3347

Online
DOI: 10.1016/j.surfcoat.2025.132216
10.1016/j.surfcoat.2025.132216
DOI: 10.18154/RWTH-2025-04540
URL: http://publications.rwth-aachen.de/record/1011093/files/1011093.pdf

Einrichtungen

Projekte

Thematische Einordnung (Klassifikation)
DDC: 670

OpenAccess:
PDF

Dokumenttyp
Journal Article

Format
online, print

Sprache
English

Anmerkung
Peer reviewed article

Externe Identnummern
SCOPUS: SCOPUS:2-s2.0-105004368798
WOS Core Collection: WOS:001509300700001

Interne Identnummern
RWTH-2025-04540
Datensatz-ID: 1011093

Beteiligte Länder
Belgium, Germany, Sweden

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; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Ebsco Academic Search ; Essential Science Indicators ; IF >= 5 ; JCR ; Nationallizenz

; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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Impurity sources and incorporation pathways during sputter deposition of Mg and Al thin films

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