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Electrical Properties of Thermally Oxidized AlInN/AlN/GaN-based Metal Oxide Semiconductor Hetero Field Effect Transistors

; ; ; ; ; ; ; ; ; ;

In
Journal of applied physics 110(8), Seiten/Artikel-Nr.:084501

ImpressumMelville, NY : IOP Publ.

Umfang5 S.

ISSN0021-8979

Online
DOI: 10.1063/1.3647589


Einrichtungen

  1. Lehr- und Forschungsgebiet GaN-Bauelementtechnologie (612020)



Dokumenttyp
Journal Article

Format
online, print

Sprache
English

Anmerkung
Peer reviewed article

Externe Identnummern
INSPEC: 12381360
WOS Core Collection: WOS:000296519900146
SCOPUS: SCOPUS:2-s2.0-80655128541

Interne Identnummern
RWTH-CONV-026580
Datensatz-ID: 147178

Beteiligte Länder
Germany, Slovakia

Lizenzstatus der Zeitschrift

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The record appears in these collections:
Document types > Articles > Journal Articles
Faculty of Electrical Engineering and Information Technology (Fac.6)
Public records
Publications database
612020

 Record created 2013-01-28, last modified 2025-11-13



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