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A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering

; ; ; ;

In
Journal of physics / D, Applied physics 41(21), Seiten/Artikel-Nr.:215301

ImpressumBristol : IOP Publ.

Umfang9 S.

ISSN0022-3727

Online
DOI: 10.1088/0022-3727/41/21/215301


Einrichtungen

  1. Fachgruppe Physik (130000)
  2. Lehrstuhl für Experimentalphysik I A und I. Physikalisches Institut (131110)



Dokumenttyp
Journal Article

Format
online, print

Sprache
English

Anmerkung
Peer reviewed article

Externe Identnummern
WOS Core Collection: WOS:000260156200030
SCOPUS: SCOPUS:2-s2.0-58149342089

Interne Identnummern
RWTH-CONV-060239
Datensatz-ID: 183676

Beteiligte Länder
Germany

Lizenzstatus der Zeitschrift

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The record appears in these collections:
Document types > Articles > Journal Articles
Faculty of Mathematics and Natural Sciences (Fac.1) > Department of Physics
Public records
Publications database
130000
131110
 Record created 2013-01-28, last modified 2020-12-04
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