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Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching

; ; ; ; ;

In
Journal of vacuum science & technology : JVST / B 25(5), Seiten/Artikel-Nr.:1626-1629

ImpressumNew York, NY : American Vacuum Society

ISSN0734-211x

Online
DOI: 10.1116/1.2769361


Einrichtungen

  1. Lehrstuhl für Experimentalphysik (Festkörperphysik) und II. Physikalisches Institut (132310)
  2. Physikalisches Institut II (hsbk010098)
  3. Fachgruppe Physik (130000)



Dokumenttyp
Journal Article

Format
online, print

Sprache
English

Anmerkung
Peer reviewed article

Externe Identnummern
WOS Core Collection: WOS:000250433500015
SCOPUS: SCOPUS:2-s2.0-34648824399

Interne Identnummern
RWTH-CONV-064475
Datensatz-ID: 188130

Beteiligte Länder
Germany

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The record appears in these collections:
Document types > Articles > Journal Articles
Faculty of Mathematics, Computer Science and Natural Sciences (Fac.1) > Department of Physics
Public records
Publications database
130000
132310
 Record created 2013-01-28, last modified 2020-12-03
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