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Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography

; ; ; ; ; ; ; ; ; ; ;

In
40th European Mask and Lithography Conference (EMLC 2025) : 16–18 June 2025, Dresden, Germany / Jo Finders, Ines Stolberg Editors ; Organized by VDE/VDI GMM – The Society of Microelectronics, Microsystems, and Precision Engineering (Germany), Seiten/Artikel-Nr: 6 Seiten

Konferenz/Event:40. European Mask and Lithography Conference , Dresden , Germany , EMLC 2025 , 2025-06-16 - 2025-06-18

: SPIE

Umfang6 Seiten

ISBN9781510694538, 9781510694545

ReiheProceedings of SPIE ; 13787

Online
DOI: 10.1117/12.3063352


Einrichtungen

  1. Lehrstuhl für Experimentalphysik und II. Physikalisches Institut (132210)
  2. Fachgruppe Physik (130000)
  3. JARA-Institut für Quanteninformation (080043)



Dokumenttyp
Contribution to a book/Contribution to a conference proceedings

Format
online, print

Sprache
English

Anmerkung
Peer review status of article unknown

Externe Identnummern
SCOPUS: SCOPUS:2-s2.0-105024941870
WOS Core Collection: WOS:001697778800014

Interne Identnummern
RWTH-2026-03571
Datensatz-ID: 1032493

Beteiligte Länder
Germany

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The record appears in these collections:
Document types > Events > Contributions to a conference proceedings
Document types > Books > Contributions to a book
Faculty of Mathematics and Natural Sciences (Fac.1) > Department of Physics
Central and Other Institutions
Public records
Publications database
080043
130000
132210
 Record created 2026-03-25, last modified 2026-03-26
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