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Spatial phase-locked combination lithography for photonic crystal devices

; ;

In
Micro and Nano Engineering 2003 : proceedings of the 29th International Conference on Micro and Nano Engineering, September 22 - 25, 2003, Cambridge, United Kingdom / ed. by J.R.A. Cleaver...

In
Microelectronic engineering 73/74.2004, Seiten/Artikel-Nr.:417-422

Konferenz/Event:29. International Conference on Micro and Nano Engineering , Cambridge , UK , 2003-09-22 - 2003-09-25

ImpressumAmsterdam [u.a.] : Elsevier

ISSN0167-9317

Auf d. Haupttitels. auch: MNE 2003

Online
DOI: 10.1016/j.mee.2004.02.080


Einrichtungen

  1. Lehrstuhl für Halbleitertechnik und Institut für Halbleitertechnik (616210)



Dokumenttyp
Journal Article/Contribution to a conference proceedings

Format
online, print

Sprache
English

Anmerkung
Peer reviewed article

Externe Identnummern
WOS Core Collection: WOS:000222145400074
SCOPUS: SCOPUS:2-s2.0-2542480366

Interne Identnummern
RWTH-CONV-032755
Datensatz-ID: 154380

Beteiligte Länder
Germany

Lizenzstatus der Zeitschrift

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The record appears in these collections:
Document types > Events > Contributions to a conference proceedings
Document types > Articles > Journal Articles
Faculty of Electrical Engineering and Information Technology (Fac.6)
Public records
Publications database
616210
 Record created 2013-01-28, last modified 2026-04-17
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