Gast ::
Comparison of multilayer stamp concepts in UV-NIL
; ; ; ; ;
In
Micro- and Nano-Engineering, MNE 2005 : proceedings of the 31st International Conference on Micro and Nano Engineering, 19 - 22 September, 2005, Vienna, Austria / Ed. by Hans Loeschner
In
Microelectronic engineering 83(4/9), Seiten/Artikel-Nr.:944-947
2006
Online
DOI: 10.1016/j.mee.2006.01.041
Einrichtungen
Dokumenttyp
Journal Article/Contribution to a conference proceedings
Format
online, print
Sprache
English
Anmerkung
Peer reviewed article
Externe Identnummern
WOS Core Collection: WOS:000237581900080
SCOPUS: SCOPUS:2-s2.0-33748257848
Interne Identnummern
RWTH-CONV-032668
Datensatz-ID: 154293
Beteiligte Länder
Austria, Germany
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