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BMBF 03ZU1106AA

Recent Publications

All known publications ...
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http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Braun, D. ; Liu, J. ; Maroufidis, V. A. ; Fiadziushkin, H. ; Völkel, L. ; Lee, J. ; Cruces, S. ; Grundmann, A. ; Ran, K. ; Wahlbrink, T. ; Kalisch, H. ; Vescan, A. ; Mayer, J.RWTH* ; Heuken, M. ; Daus, A. ; Lemme, M. C. (Corresponding author)RWTH*
Influence of Top Electrode Metal on Resistive Switching in Multilayer MOCVD MoS 2 Memristors
Advanced electronic materials e00017 (2026) [10.1002/aelm.202600017]2026   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Lee, J.RWTH* ; Cruces, S.RWTH* ; Liu, X. ; Chen, Y. ; Maroufidis Andreadis, V.RWTH* ; Jo, J. ; Völkel, L.RWTH* ; Braun, D.RWTH* ; Möller, M. ; Brackmann, L.RWTH* ; Kalisch, H.RWTH* ; Heuken, M.RWTH* ; Vescan, A.RWTH* ; Dunin-Borkowski, R. E. ; Mayer, J.RWTH* ; Wiefels, S. ; Lemme, M. C. (Corresponding author)RWTH*
Integration of Low‐Voltage Nanoscale MoS 2 Memristors on CMOS Microchips
Advanced functional materials e27644 (2026) [10.1002/adfm.202527644]2026     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Wang, Y.RWTH* ; Tang, S.RWTH* ; Wang, Z. ; Ding, Y.RWTH* ; Fiadziushkin, H.RWTH* ; Ghiami, A.RWTH* ; Hoffmann-Eifert, S. ; Heuken, M.RWTH* ; Vescan, A.RWTH* ; Kalisch, H. (Corresponding author)RWTH*
Water-assisted multistep MOCVD for wafer-scale layer-by-layer growth of WSe2
MRS bulletin 50(11), 1283-1295 (2025) [10.1557/s43577-025-00948-1]2025   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Fa, Y.RWTH* ; Buttberg, M.RWTH* ; Ran, K.RWTH* ; Ahmad, R. W.RWTH* ; Braun, D.RWTH* ; Völkel, L.RWTH* ; Lee, J.RWTH* ; Cruces, S.RWTH* ; Macco, B. ; Canto, B. ; Lerch, H. ; Wahlbrink, T. ; Kalisch, H.RWTH* ; Heuken, M.RWTH* ; Vescan, A.RWTH* ; Mayer, J.RWTH* ; Wang, Z. ; Valov, I.RWTH* ; Menzel, S.RWTH* ; Lemme, M. C. (Corresponding author)RWTH*
Intermediate Resistive State in Wafer-Scale Vertical MoS2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications
Advanced functional materials e26682 (2025) [10.1002/adfm.202526682]2025     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Abstract/Contribution to a book/Contribution to a conference proceedings Fa, Y. ; Braun, D. ; Völkel, L.RWTH* ; Lerch, H. ; Kalisch, H.RWTH* ; Heuken, M. ; Vescan, A.RWTH* ; Wang, Z. ; Lemme, M. C.RWTH*
Volatile and Nonvolatile Resistive Switching in Wafer-Scale MoS2 Memristors
20252025 Silicon Nanoelectronics Workshop : June 8-9, 2025, Rihga Royal Hotel Kyoto, Kyoto, Japan : workshop abstracts / AP, [the Japan Society of Applied Physics], Electron Devices Society ; general chair: Kuniyuki Kakushima (Institute of Science Tokyo)
2025 Silicon Nanoelectronics Workshop, SNW, KyotoKyoto, Japan, 8 Jun 2025 - 9 Jun 20252025-06-082025-06-09 [Piscataway, NJ] : IEEE 80-81 (2025) [10.23919/SNW65111.2025.11097209]2025   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Contribution to a book/Contribution to a conference proceedings Lee, J. ; Cruces, S. ; Braun, D. ; Völkel, L.RWTH* ; Ran, K. ; Mayer, J.RWTH* ; Daus, A. ; Lemme, M. C.RWTH*
Enhanced Threshold Switching Devices Based on Conductive Filaments in SiOx Through Vertically Aligned MoS2 Layers
2025Shaping the future with innovations in devices and manufacturing : the 9th IEEE Electron Devices Technology and Manufacturing Conference (EDTM 2025) : Hong Kong, China, 9-12 March 2025 / EDTM - Electron Devices Technology and Manufacturing Conference 2025 ; organized by: IEEE, Electron Devices Society
9. IEEE Electron Devices Technology & Manufacturing Conference, EDTM 2025, Hong KongHong Kong, Hong Kong, 9 Mar 2025 - 12 Mar 20252025-03-092025-03-12 [Piscataway, NJ] : IEEE (2025) [10.1109/EDTM61175.2025.11041161]2025   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Contribution to a book/Contribution to a conference proceedings Lemme, M. C.RWTH* ; Völkel, L.RWTH* ; Cruces, S. ; Lee, J. ; Fa, Y.
2D Materials for Neuromorphic Computing Devices
2025Shaping the future with innovations in devices and manufacturing : the 9th IEEE Electron Devices Technology and Manufacturing Conference (EDTM 2025) : Hong Kong, China, 9-12 March 2025 / EDTM - Electron Devices Technology and Manufacturing Conference 2025 ; organized by: IEEE, Electron Devices Society
9. IEEE Electron Devices Technology & Manufacturing Conference, EDTM 2025, Hong KongHong Kong, Hong Kong, 9 Mar 2025 - 12 Mar 20252025-03-092025-03-12 [Piscataway, NJ] : IEEE (2025) [10.1109/EDTM61175.2025.11041583]2025   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Lee, J.RWTH* ; Ahmad, R. W.RWTH* ; Cruces, S.RWTH* ; Braun, D.RWTH* ; Völkel, L.RWTH* ; Ran, K.RWTH* ; Maroufidis Andreadis, V.RWTH* ; Mayer, J.RWTH* ; Menzel, S.RWTH* ; Daus, A. (Corresponding author)RWTH* ; Lemme, M. C. (Corresponding author)RWTH*
Threshold switching in vertically aligned MoS2/SiOx heterostructures based on silver ion migration
npj 2D materials and applications 9(1), 86 (2025) [10.1038/s41699-025-00614-9]2025     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Tang, S. (Corresponding author)RWTH* ; Wang, Y.RWTH* ; Fiadziushkin, H.RWTH* ; Ding, Y.RWTH* ; Ghiami, A.RWTH* ; Heuken, M.RWTH* ; Vescan, A.RWTH* ; Kalisch, H.RWTH*
Real‐Time Monitoring of 2D TMDC MOCVD: An In Situ Spectroscopic Reflectance Approach
Advanced materials interfaces 12(22), e00349 (2025) [10.1002/admi.202500349]2025     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Ran, K. (Corresponding author)RWTH* ; Jo, J. ; Cruces, S.RWTH* ; Wang, Z. ; Dunin-Borkowski, R. E. ; Mayer, J.RWTH* ; Lemme, M. C. (Corresponding author)RWTH*
Unraveling the dynamics of conductive filaments in MoS2-based memristors by operando transmission electron microscopy
Nature Communications 16, 7433 (2025) [10.1038/s41467-025-62592-2]2025     Files BibTeX | EndNote: XML, Text | RIS

All known publications ...
Download: BibTeX | EndNote XML,  Text | RIS |