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Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

; ; ; ; ; ; ; ;

In
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV : 22-26 February 2021, online only, Unites States / Ofer Adan, John C. Robinson (editors) ; sponsored by: SPIE, Seiten/Artikel-Nr: 13 Seiten + Poster

Konferenz/Event:Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV , online , 2021-02-22 - 2021-02-27

Konferenz/Event:SPIE Advanced Lithography , online , 2021-02-22 - 2021-02-27

ImpressumBellingham, Washington : SPIE

Umfang13 Seiten + Poster

ISBN978-1-5106-4055-9, 978-1-5106-4056-6

ReiheProceedings of SPIE ; 11611

Online
DOI: 10.1117/12.2584738


Einrichtungen

  1. Lehrstuhl für Technologie optischer Systeme (418910)
  2. JARA-FIT (080009)
  3. Fraunhofer-Institut für Lasertechnik - ILT (053100)
  4. Lehr- und Forschungsgebiet für Experimentalphysik (139420)
  5. Fachgruppe Physik (130000)



Dokumenttyp
Contribution to a book/Contribution to a conference proceedings

Format
online, print

Sprache
English

Anmerkung
Peer reviewed article

Externe Identnummern
SCOPUS: SCOPUS:2-s2.0-85105527090

Interne Identnummern
RWTH-2021-02582
Datensatz-ID: 815331

Beteiligte Länder
Germany

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The record appears in these collections:
Document types > Events > Contributions to a conference proceedings
Document types > Books > Contributions to a book
Faculty of Mathematics and Natural Sciences (Fac.1) > Department of Physics
Faculty of Mechanical Engineering (Fac.4)
Affiliated Institutes and Associations
Central and Other Institutions
Public records
Publications database
080009
053100
130000
418910
139420
 Record created 2021-03-10, last modified 2025-10-14
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