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139420

⇧ RWTH Aachen ⇧

Recent Publications

All known publications ...
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http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Awal, A.RWTH* ; Hetzel, J. H. ; Gebel, R. ; Pretz, J.RWTH*
Injection optimization at particle accelerators via reinforcement learning: From simulation to real-world application
Physical review accelerators and beams : PRAB 28(3), 034601 (2025) [10.1103/PhysRevAccelBeams.28.034601]2025     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Hurdax, P. ; Kern, C. S. ; Boné, T. G. ; Haags, A.RWTH* ; Hollerer, M. ; Egger, L. ; Yang, X.RWTH* ; Kirschner, H. ; Gottwald, A. ; Richter, M. ; Bocquet, F. C. ; Soubatch, S.RWTH* ; Koller, G. ; Tautz, F. S. ; Sterrer, M. ; Puschnig, P. ; Ramsey, M. G. (Corresponding author)
Large Distortion of Fused Aromatics on Dielectric Interlayers Quantified by Photoemission Orbital Tomography
ACS nano 16(10), 17435-17443 (2022) [10.1021/acsnano.2c08631]2022     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Contribution to a book/Contribution to a conference proceedings Ghafoori, M. (Corresponding author)RWTH* ; Bahrenberg, L.RWTH* ; Glabisch, S.RWTH* ; Schröder, S.RWTH* ; Danylyuk, S. ; Brose, S.RWTH* ; Stollenwerk, J.RWTH* ; Juschkin, L.RWTH* ; Loosen, P.RWTH*
Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization
2021Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV : 22-26 February 2021, online only, Unites States / Ofer Adan, John C. Robinson (editors) ; sponsored by: SPIE
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, onlineonline, 22 Feb 2021 - 27 Feb 20212021-02-222021-02-27
SPIE Advanced Lithography, onlineonline, 22 Feb 2021 - 27 Feb 20212021-02-222021-02-27 Bellingham, Washington : SPIE, Proceedings of SPIE 11611, 13 Seiten + Poster (2021) [10.1117/12.2584738]2021   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Mochi, I. ; Fernandez, S. ; Nebling, R. ; Locans, U. ; Rajeev, R. ; Dejkameh, A. ; Kazazis, D. ; Tseng, L.-T. ; Danylyuk, S. ; Juschkin, L.RWTH* ; Ekinci, Y. (Corresponding author)
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Journal of micro/nanolithography, MEMS and MOEMS 19(1), 014002 (2020) [10.1117/1.JMM.19.1.014002]2020   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Wilson, D. (Corresponding author)RWTH* ; Schmitz, C.RWTH* ; Rudolf, D.RWTH* ; Wiemann, C.RWTH* ; Schneider, C. M.RWTH* ; Juschkin, L.RWTH*
On space charge effects in laboratory-based photoemission electron microscopy using compact gas discharge extreme ultraviolet sources
New journal of physics 22(10), 103019 (2020) [10.1088/1367-2630/abbc29]2020     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Deuter, V. (Corresponding author)RWTH* ; Grochowicz, M.RWTH* ; Brose, S.RWTH* ; Biller, J.RWTH* ; Danylyuk, S. ; Taubner, T.RWTH* ; Siemion, A. ; Grützmacher, D.RWTH* ; Juschkin, L.RWTH*
Computational proximity lithography with extreme ultraviolet radiation
Optics express 28(18), 27000-27012 (2020) [10.1364/OE.398805]2020     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Jimenez, K. (Corresponding author)RWTH* ; Nicolosi, P. ; Juschkin, L.RWTH* ; Ahmed, N. ; Gaballah, A. E. H. ; Cattaruzza, E. ; Sertsu, M. G. ; Gerardino, A. ; Giglia, A. ; Mussler, G.RWTH* ; Zuppella, P.
Extreme ultraviolet free-standing transmittance filters for high brilliance sources, based on Nb/Zr and Zr/Nb thin films on Si3N4 membranes: Design, fabrication, optical and structural characterization
Thin solid films 695, 137739 (2020) [10.1016/j.tsf.2019.137739]2020   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Contribution to a book/Contribution to a conference proceedings Brose, S. (Corresponding author)RWTH* ; Danylyuk, S.RWTH* ; Bahrenberg, L.RWTH* ; Lebert, R. ; Stollenwerk, J.RWTH* ; Loosen, P.RWTH* ; Juschkin, L.RWTH*
EUV-LET 2.0 : a compact exposure tool for industrial research at a wavelength of 13.5nm
2019Extreme Ultraviolet (EUV) Lithography X : 25-28 February 2019, San Jose, California, Unites States / Kenneth A. Goldberg (editor) ; sponsored by: SPIE
Extreme Ultraviolet (EUV) Lithography X, San Jose, CASan Jose, CA, USA, 25 Feb 2019 - 28 Feb 20192019-02-252019-02-28 Bellingham, Washington, USA : SPIE, Proceedings of SPIE 10957, 109571K (2019) [10.1117/12.2513755]2019   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Tryus, M. (Corresponding author)RWTH* ; Nikolaev, K. V. ; Makhotkin, I. A. ; Schubert, J.RWTH* ; Kibkalo, L.RWTH* ; Danylyuk, S.RWTH* ; Giglia, A. ; Nicolosi, P. ; Juschkin, L.RWTH*
Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry
Thin solid films 680, 94-101 (2019) [10.1016/j.tsf.2019.04.037]2019   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Schümmer, A. (Corresponding author) ; Mertins, H.-C. ; Schneider, C. M. ; Adam, R. ; Trellenkamp, S. ; Borowski, R. ; Juschkin, L.RWTH* ; Berges, U.
Fast and easy fabrication methodology of Fresnel zone plates for the extreme ultraviolet and soft x-ray regions
Applied optics 58(4), 1057-1063 (2019) [10.1364/AO.58.001057]2019   BibTeX | EndNote: XML, Text | RIS

All known publications ...
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