In situ X-ray measurements over large Q-space to study the evolution of oxide thin films prepared by RF sputter deposition

Walter, P.; Wernecke, J.; Rothkirch, A.; Dippel, A.-C.; Faley, Olga; Reuther, D.; Klemradt, Uwe; Scholz, M.; Schipmann, Susanne; Resta, A.; Vlad, A.; Blume, J.; Haas, D.; Nent, Alexander; Seeck, O.

doi:WOS:000572707700002

In situ X-ray measurements over large Q-space to study the evolution of oxide thin films prepared by RF sputter deposition

Walter, P. (Corresponding author) ; Wernecke, J. ; Scholz, M. ; Reuther, D. ; Rothkirch, A. ; Haas, D. ; Blume, J. ; Resta, A. ; Vlad, A. ; Faley, Olga^RWTH* ; Schipmann, Susanne^RWTH* ; Nent, Alexander^RWTH* ; Seeck, O. ; Dippel, A.-C. ; Klemradt, Uwe^RWTH*

In
Journal of materials science 56, Seiten/Artikel-Nr.:290-304

2021 & 2020

ImpressumDordrecht [u.a.] : Springer Science + Business Media B.V

ISSN1573-4803

Published: 25 September 2020

Online
DOI: 10.1007/s10853-020-05337-4
10.1007/s10853-020-05337-4

Einrichtungen

Thematische Einordnung (Klassifikation)
DDC: 670

Dokumenttyp
Journal Article

Format
online

Sprache
English

Anmerkung
Peer reviewed article

Externe Identnummern
SCOPUS: SCOPUS:2-s2.0-85091506255
WOS Core Collection: WOS:000572707700002

Interne Identnummern
RWTH-2020-10255
Datensatz-ID: 804410

Beteiligte Länder
France, Germany, USA

Lizenzstatus der Zeitschrift

; Clarivate Analytics Master Journal List ; Current Contents - Electronics and Telecommunications Collection ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; DEAL Springer ; DEAL Springer ; Ebsco Academic Search ; Essential Science Indicators ; IF < 5 ; IF < 5 ; JCR ; Nationallizenz