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⇧ RWTH Aachen ⇧

Recent Publications

All known publications ...
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http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Schnitzler, H. J. (Author) ; Platen, W. (Author) ; Kohl, D. (Author) ; Wolter, K. (Author)
Process dependent interface states of Ag/(110) GaAs Schottky-diodes
Materials science forum 38/41, 1409-1414 (1989)1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Eden, K. (Author) ; Beneking, H. (Author) ; Roth, W. (Author) ; Krings, A.-M. (Author)
Influence of DUV excimer laser radiation ( = 193nm) on CMOS devices
Applied surface science 36, 421-431 (1989)1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Hostalek, M. (Author) ; Pohl, L. (Author) ; Brauers, A. (Author) ; Balk, P. (Author) ; Frese, V. (Author) ; Hardtdegen, H. (Author) ; Hövel, R. (Author) ; Regel, G. K. (Author) ; Molassioti, A. (Author) ; Moser, M. (Author) ; Scholz, F. (Author)
Novel organometallic starting materials for group III-V semiconductor metal-organic chemical vapor deposition
Thin solid films 174, 1-4 (1989)1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Beneking, H. (Author)RWTH*
III-V technology: The key for advanced devices
Journal of the Electrochemical Society : JES 136, 2680-2686 (1989) [10.1149/1.2097549]1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Westphalen, R. (Author) ; Jürgensen, H. (Author) ; Balk, P. (Author)
Epilayers with extremely low dislocation densities grown by isoelectronic doping of hydride VPE grown InP
Journal of crystal growth 96(4), 982-984 (1989) [10.1016/0022-0248(89)90660-X]1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Grützmacher, D. (Author) ; Meyer, R. (Author) ; Balk, P. (Author) ; Berg, C. (Author) ; Schäpers, T. (Author) ; Lüth, H. (Author) ; Zachau, M. (Author) ; Koch, F. (Author)
Properties of the two-dimensional electron gas in modulation-doped GaInAs(P)/InP structures grown by low-pressure metal-organic vapor-phase epitaxy
Journal of applied physics 66, 697-703 (1989)1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Leiber, J. (Author) ; Brauers, A. (Author) ; Heinecke, H. (Author) ; Lüth, H. (Author) ; Balk, P. (Author)
Growth of GaAs and InP on Si using plasma stimulated MOCVD
Journal of crystal growth 96, 483-489 (1989)1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Maile, B. E. (Author) ; Forchel, A. (Author) ; German, R. (Author) ; Menschig, A. (Author) ; Meier, H. P. (Author) ; Grützmacher, D. (Author)
Nanometer lithography for III-V semiconductor wires using chloromethylated poly-* methylstrene resist
Journal of vacuum science & technology : JVST / B 6, 2308-2311 (1989)1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Eden, K. (Author) ; Krings, A.-M. (Author) ; Beneking, H. (Author) ; Maul, M. (Author) ; Müller, J. (Author)
Degradation of Cr- and MoSi2 photomasks by 193 nm excimer laser radiation
Microelectronic engineering 9, 65-68 (1989)1989   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Lauer, V. (Author) ; Balk, P. (Author)
Process induced radiation damage in MOS structures
Microelectronic engineering 9, 611-614 (1989)1989   BibTeX | EndNote: XML, Text | RIS

All known publications ...
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